晶圆质量控制方法

Abstract

The invention discloses a wafer quality control method. The relation between acceptable test parameter and yield as well as time can be acquired according to the acceptable test parameters and the yields of various wafers measured at different time. If both the acceptable test parameter and the yield drift as time goes by and the correlative probability of the time is less than a first set value, the tendency of the yield as the acceptable parameter drifts can be obtained according to the acceptable parameter and the yield. The correlative coefficients of the yield and the acceptable parameter can be obtained according the tendency of the yield along with the drift of the acceptable parameter. If the correlative coefficients of the yield and the acceptable parameter are equal to or greater than a second set value, the acceptable parameter is a doubtful parameter correlative to the ineffectiveness of the wafer. If the correlative coefficients of the yield and the acceptable parameter are less than the second set value, the acceptable parameter is not the doubtful parameter correlative to the ineffectiveness of the wafer. The wafer quality control method disclosed by the invention is more accurate.
本发明公开了一种晶圆质量控制方法,包括,根据不同时间测量的各盒晶圆的可接受测试参数和良率,得到可接受测试参数和良率与时间的关系;如果可接受测试参数和良率均随时间产生漂移并且与时间的相关性概率小于第一设定值,则根据可接受测试参数和良率,得到良率随可接受测试参数漂移趋势;根据良率随可接受测试参数漂移趋势,得到良率和可接受测试参数的相关系数;如果良率和可接受测试参数的相关系数大于或等于第二设定值,则可接受测试参数是与晶圆失效有关的可疑参数;如果良率和可接受测试参数的相关系数小于第二设定值,则可接受测试参数不是与晶圆失效有关的可疑参数。本发明晶圆质量控制方法较精确。

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Cited By (3)

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    CN-102110584-BSeptember 26, 2012中芯国际集成电路制造(上海)有限公司一种获得生产线新产品基准产品良率方法
    CN-102117730-BOctober 31, 2012中芯国际集成电路制造(上海)有限公司半导体制造过程中的机台参数数据的处理方法和装置
    CN-104900551-ASeptember 09, 2015中芯国际集成电路制造(上海)有限公司, 中芯国际集成电路制造(北京)有限公司Wafer quality management and control method and device